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Type of chuck is characterized by the dielectric material and the resulting mechanism of force generation. Chucks can be either monopolar or bipolar. Slab-type or pin-type based on the surface characteristics. A pin-type chuck is proposed to minimize the effects of particles.
24 de nov. de 2003 · Article history. Views. Share. Tools. Clamping and residual clamping forces of a Johnsen–Rahbek-type (JR-type) bipolar electrostatic chuck (ESC), which has electrically independent dual electrodes, were measured. Area ratios of the ESC’s two electrodes ranged from 1 to 4.6.
3 de mar. de 2017 · This paper establishes an equivalent circuit model for a bipolar electrostatic chuck containing distributed embosses on dielectric layer surface, and deduces a unified form of mathematical expression describing decaying force, which can cover the two types. The obtained equations can also predict steady force in working state.
This paper describes the development of bipolar electrostatic chucks with a compliant beam-array structure using abrasive water jet technology. The chucks are cut out from 3D-printed composite-laminated plates and the attractive forces that they generate are measured.
ESCs employ a platen with integral electrodes which are biased with high voltage to establish an electrostatic holding force between the platen and wafer, thereby “chucking” the wafer. Presently, most process tool manufactures use low speed DC signals to control high voltage power supplies.
12 de feb. de 2018 · This paper establishes an equivalent circuit model for a bipolar electrostatic chuck containing distributed embosses on dielectric layer surface, and deduces a unified form of mathematical expression describing decaying force, which can cover the two types. The obtained equations can also predict steady force in working state.
Dielectric Thickness, d. Thus, if κr ~ 10 (alumina), a gap 1/10 of the dielectric thickness will Figure 1. Basic bipolar electrostatic operation decrease grip pressure by a factor of 4. Figure 1 illustrates a bipolar chuck for which the above V is half of the voltage between electrodes A and B; for symmetric electrodes V = [ -VA + VB] / 2. The ...
